Equipment	Multi purpose 60 kW RF(ICP) Type Plasma System
Specifications	ICP(RF) plasma generator Dual output Power supply - frequency: 1 - 3 MHz - power: Vp x lp ≥ 100 kW efficyency ≥ 60 % @ 60 kW RF Torch : Silicon Nitride Confinement Tube (ID 50 mm) Nano powder synthesis system Reactor dimension : ID (165 mm), L (700 mm) Cooling Water Cooled with double wall water jacket Collector :sintered metal filters (total surface area: 22 m²) Thermal spray plasma coating system Spray chamber dimension : ID (900 mm), L (1.000 mm) vertical axis rotation speed (Z): 280 rpm Translation distance: 500 mm Translation speed : 50 mm/sec Minimum spraying distance: 300 mm Maximum spraying distance: 500 mm Precursor feeding system Feedable Particle size Dso=1-10㎛ Feeding rate rage : 200 - 1200 g/hr Feeding accuracy: ≤ ± 2 % Canister volume : 1.5 liter Pressure control system Capacity : 4,000 lpm Minimum vacuum pressure:5 X 10-3 torr Operating pressure : > 350 torr @ 1200 lpm Gas recirculation system Gas mixture recycling capacity:Ar/H₂/N₂/O₂/ He Inlet gas capacity : 3.3 m³/min @ -50 kPa Water cooling system Automated process control
Space 설치장소	The high enthalphy plasma research center 고온플라즈마 응용연구센터
Maker 제작사	PLASNIX(korea)	Introduction Time	2012. 02.
	플라즈닉스(한국)	도입시기